TEMPERATURE DISTRIBUTION ANALYSIS IN PARALLEL PLATE TREATMENT CHAMBER FOR PULSED ELECTRIC FIELD PROCESSING: NUMERICAL STUDY

نویسندگان

چکیده

Studies on temperature distribution in parallel plate treatment chambers are limited due to its design which is more prone arcing, thus, neglecting use continuous processing. Therefore, this study discusses the Joule heating a chamber acting mode. The numerical results predict that at slow flow rate (i.e., 0.0234 cm3/s), fluid near wall static state (0 cm/s), increasing residence time and resulting receiving pulses. In situation, increased dramatically from 25 °C (inlet temperature) approximately 58 °C, i.e., 132 % increment. On other hand, slight increase < 27 °C) predicted by simulation higher 0.138 cm3/s) same location (near wall). This less rise low causes liquid quickly leave area, getting pulse. soar condition very 8 of inlet temperature. From obtained, control helps reduce rise, keeping ambient or slightly above reducing risk treated media experiencing adverse effects physical attributes as result high temperatures.

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ژورنال

عنوان ژورنال: ASEAN Engineering Journal

سال: 2022

ISSN: ['2586-9159']

DOI: https://doi.org/10.11113/aej.v12.16551